The Polaris™ packages feature the most advanced research sputtering sources and magnetron power supply available at an economical price.  Simply select the sputtering source from the wide variety of configurations offered and note the target mounting method to define the exact package desired.  Click here to examine your options.

Polaris™ sources provide industrial robustness and performance in a small package.  They can operate stably at low 10^-4 Torr background pressures at very low power levels.  Conversely, because cooling water flow rates through the sources are nearly 2.5x that of competing sources, extremely high power levels can be achieved using directly water cooled targets during long process runs and pre-commercial development efforts.

The Ion™ DC Magnetron Power Supply is a full featured, advanced, software driven device - detecting and suppressing arcs in < 100 nsecs (.1 µ secs).  It has a wide 0-1000 volt range compared to 0-800 volts supply supplied by competitors allowing full rated power under nearly all conditions.  It is packaged in a compact, low profile 19" rack mount chassis.  Click here for more information.

An optional DC Pass/RF Blocking Filter is required tp protect the Ion™ DC Magnetron Power Supply if an RF power supply will be used to drive a second sputtering source or to provide substrate bias.

Everything required to install the Polaris™ internally mounted sputtering source into the users system and connect it to the Ion™ DC Magnetron Power Supply is supplied, including all necessary electrical, gas, rotary motion, vacuum hardware and an 8' long cable between the sputtering source and power supply.  A comprehensive documentation package is provided.  Other feedthrough arrangements and cable lengths are possible - please consult the factory.